PVD systems
  CVD systems
  HPPMS/MPP systems
  Surface analysis
 
 
CVD Systems
 

The chemical vapor deposition (CVD) process is a popular thin film deposition technology used to produce a wide range of metal, ceramic and polymers coatings. In CVD, the material being deposited is generated from chemical vapor precursor species that are decomposed by reduction or thermal decomposition and come into contact with a heated substrate surface, and where they react or decompose forming a solid phase on the hot surface. CVD is not a ‘line of sight’ process and offers some distinct advantages such as uniform deposition over complex geometries (‘conformal’ deposition) and large areas, and relatively easy control of stoichiometry of deposited films. CVD is capable of producing a wide range of coating materials, including nitrides, carbides and oxides, such as TiN, TiCN, TiC, DLC (diamond-like carbon), TiB2, Al2O3, etc. CVD/PECVD has also been used in a multitude of semiconductor wafer fabrication processes, including the production of amorphous and polycrystalline thin films, e.g. amorphous silicon for solar cell, polycrystalline silicon for gate contact, deposition of SiO2 and silicon nitride, etc.

Plasma enhanced chamical vapor deposition system (PECVD)

(PECVD provides considerable potential to be utilized in the deposition of semiconductive coatings. PECVD reactors operate under low pressure, but do not depend completely on thermal energy to accelerate the reaction processes.The typical deposition temperature in PECVD can be reduced below 500°C. The relatively low deposition temperature makes PECVD suitable for a wide range of substrates including tool steel and hot work tool steel and Si wafers used in microelectronics so that the deposition temperature is below the tempering temperature of tool steels therefore maintaining the required microstructure and properties of the substrate and minimizing distortion of the substrate. )

 

Metal-Organic Chemical Vapour Deposition (MOCVD)

(MOCVD uses MO (Metal organic) compound as source of the material. MOCVD passes metal oxides across a very hot work piece in an inert gas to precisely deposit layers of metal oxide on the surface, which has specific optical and electrical properties. The materials to be coated must be able to withstand the extreme temperatures associated with this process)

 

 
 
 
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